OES.EPD
$499.00
The sensor detects endpoints of the etching process and changes in etchant or by-product through spectral analysis of plasma in the semiconductor/display etching chamber.
- Semiconductor, LCD/OLED, LED, MEMS, Logic device sectors
- Etch, plasma treatment, PR/ACL strip, PECVD
- Advanced EPD algorithms
- (Differential threshold/window method/MVA)
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OESEPD
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The sensor detects endpoints of the etching process and changes in etchant or by-product through spectral analysis of plasma in the semiconductor/display etching chamber.
- Semiconductor, LCD/OLED, LED, MEMS, Logic device sectors
- Etch, plasma treatment, PR/ACL strip, PECVD
- Advanced EPD algorithms
- (Differential threshold/window method/MVA)